Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Enhanced Spatial PEB Uniformity through a Novel Bake Plate Design | Semantic Scholar
CD uniformity at pitch 80nm after a/litho and b/etch for negative tone... | Download Scientific Diagram
Global ASI CD uniformity comparison between n&k R-T Scatterometer and... | Download Scientific Diagram
Controlling Uniformity At The Edge
Intrawafer CD uniformity trend for Etch GATE in 40nm > 30% CD... | Download Scientific Diagram
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
A study of AA CD uniformity loading optimization at 28nm node | Semantic Scholar
CD uniformity maps obtained using the optical technique described... | Download Scientific Diagram
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Intel and Nikon Litho Specialists Discuss Overlay Matching and Edge Placement Error for Production Beyond 20 nm
Extending ArFi to 22 nm and Beyond with Advanced CDU Control
Process Setup and Optimization • LithExx-Systems
슬라이드 1
CD Uniformity comparison of random contact windows with ArF and KrF... | Download Scientific Diagram
a) Across wafer CD uniformity for 110 nm wide (nominal) feature after... | Download Scientific Diagram
PPT - Sub-65 nm CD Uniformity in Semiconductor Manufacture PowerPoint Presentation - ID:6596227